ASML - Architect - Material and Process System Job in Veldhoven, Netherlands

ASML is one of the world’s leading manufacturers of chip-making equipment.

Our vision is to enable affordable microelectronics that improve the quality of life.

To achieve this, our mission is to invent, develop, manufacture and service advanced technology for high-tech lithography, metrology and software solutions for the semiconductor industry.

ASML's guiding principle is continuing Moore's Law towards ever smaller, cheaper, more powerful and energy-efficient semiconductors. This results in increasingly powerful and capable electronics that enable the world to progress within a multitude of fields, including healthcare, technology, communications, energy, mobility, and entertainment.

ASML - Architect - Material and Process System Job Description

Job Description
The senior Material and Process System Architect should coordinate the membrane film strategy; overlooking all membrane thin film generations, giving directions to all, managing the risks and learnings. Pro-actively supports setting-up new membrane film related activities. Interfacing with scanner specifications and re-alignment based upon new film performance insights/requirements.The responsibility of the architect is to define what work packages are needed for this, what the priorities are, and to document these work packages and to get agreement on them.The architect will also have a firm role in the interfacing with internal (management) and external (suppliers, R&D partners) stakeholders of the membranes, as well as with related projects inside the company.

Context of the position
The department Wafer Clamping & Particle Contamination Control is part of the EUV Business Line in ASML. Its task is to specify, develop, integrate, qualify and industrialize wafer clamps, pellicles and particle contamination solutions in the area of EUV (Extreme Ultra Violet) Scanner Technology.

The Pellicle group is part of this department.The holder of the position reports to the manager EUV Pellicle and is operational within multidisciplinary projects.The group Pellicle is responsible for optimizing the EUV scanner performance by providing a membrane (pellicle) which can be applied in an EUV scanner.

The membranes should increase the defectivity performance of an EUV scanner without having negative impact on other performance parameters. The ASML NXE systems must be made such that they can operate with an EUV pellicle on the reticle, to protect the reticle from particles. Because the pellicle is in the EUV light path spectral effects require another membrane in the light path, as a spectral filter.

Both the material stack and the processing of the pellicle and the spectral filter membrane must be defined to meet the product performance as defined for the various generations of membranes.

ASML - Architect - Material and Process System Job Requirements

University physics, material science or chemical engineering, preferably PhD.

Experience

• Has (>10 years) experience in an architect or technical leadership role
• Is familiar with “product research”, “product development” and “material development”, preferably within ASML.
• Ability to cover activities ranging from research phase, development phase, pilot production to ramp up in high volume production
• Ability to interact with customers and convince them on your strategy and plan
• Very high knowledge level on thin film technology and materials (properties, processing, interfaces)
• Is familiar with a high tech production process, e.g. semiconductors, displays
• Working in a multi-disciplinary environment is a second nature
• Has extensive experience with process development
• Lithography Scanner, source, vacuum systems experience is a pre
• Preferably has experience in a project where activities covered all the way from (a) supplier(s) to the end user

• Broad technical view, ability to oversee the impact of details on the big picture
• Can translate high level requirements into SMART work packages (including staffing and timing input)
• Leadership to drive forward the technical progress
• Excellent communication skills on technical and executive level
• Can get people on board (influencing without formal power/negotiating skills), good communicational skills (verbal and written): Make sure the work packages are accepted and executed
• Can work independently in a dynamic, explorative environment
• Strong analytical ability with a pragmatic attitude
• Highly committed and flexible (working outside office hours, changing requirements and boundary conditions)
• Robust personality is a must

• Willing to travel (USA, Asia) if needed
• Good knowledge of English language
• Driving license

ASML - Architect - Material and Process System Application Information

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