ASML - DE EUV – Reticle Engineer for Reticles & Imaging applic Job in Veldhoven, Netherlands

ASML is one of the world’s leading manufacturers of chip-making equipment.

Our vision is to enable affordable microelectronics that improve the quality of life.

To achieve this, our mission is to invent, develop, manufacture and service advanced technology for high-tech lithography, metrology and software solutions for the semiconductor industry.

ASML's guiding principle is continuing Moore's Law towards ever smaller, cheaper, more powerful and energy-efficient semiconductors. This results in increasingly powerful and capable electronics that enable the world to progress within a multitude of fields, including healthcare, technology, communications, energy, mobility, and entertainment.

ASML - DE EUV – Reticle Engineer for Reticles & Imaging applic Job Description

As an ASML Principle Architect in the DE-EUV-ISQ department you will be a key player in a very fast-paced, multidiscipline environment. In the Reticles and Imaging Applications group, you will be involved in the technology development and integration of our scanners. You are expected to integrate with the dynamic and diverse ASML community.

Job Description

As Principle Architect you take ownership of the reticle technology part in ASML.You will be the center point in our department for the knowledge on defects and particles for EUV reticles. You will be responsible for defining particle specs towards our reticle suppliers and delivering workable procedures to our production facilities regarding reticle handling and contamination. You need to align with the metrology engineers and contamination specialist in our department as well with ASML Wilton and our reticle suppliers. You will be responsible for the defect and contamination part of the reticle technology roadmap in alignment with our suppliers and customers. As Principle Architect you will interface with the ASML technology roadmap owners of Focus, Overlay and Imaging.

Context of the position

The holder of this position is reporting to the GL Reticles and Imaging Applications

ASML - DE EUV – Reticle Engineer for Reticles & Imaging applic Job Requirements

Solid technical background (BSc/MSc/PhD in physics, optics, nano technology or related).

Experience

Experience (> 3 years) in the semiconductor industry, focusing on lithography.

Personal skills

• Robust personality is a must
• Strong pragmatic attitude with an analytical view.
• Self-propelling with a lot of initiative and drive. Able to initiate, influence, stir.
• Out-of-the-box thinker.
• Team player, responsible and reliable.
• Able to distinguish main matters from side issues. Able to develop a vision.
• Excellent communicator. Knows how to convey complex topics in an understandable fashion.
• Convincing. Speaks up. Able to convey a vision.
• Flexible and committed.

ASML - DE EUV – Reticle Engineer for Reticles & Imaging applic Application Information

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ASML - DE EUV – Reticle Engineer for Reticles & Imaging applic Summary

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